Kundu, Sandip. <br/><br/>
Nanoscale CMOS VLSI circuits :    design for manufacturability /  
 Nanoscale complementary metal oxide semiconductor very large-scale integration circuits 
Sandip Kundu, Aswin Sreedhar. 
 - New York :    McGraw-Hill,    c2010. 
 - xv, 296 p. :    ill. ;    24 cm. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/>Semiconductor manufacturing -- Process and device variability : analysis and modeling -- Manufacturing-aware physical design closure -- Metrology, manufacturing defects, and defect extraction -- Defect impact modeling and yield improvement techniques -- Physical design and reliability -- Design for manufacturability : tools and methodologies. 
<br/><br/> This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource. 
<br/><br/><label>ISBN: </label>9780071635196 007163519X 
<br/><br/><label>LCCN: </label>2010022678 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Metal oxide semiconductors, Complementary -- Design and construction.<br/>Integrated circuits -- Very large scale integration -- Design and construction.<br/>Nanoelectronics.
<br/><br/><label>Dewey Class. No.: </label>621.395